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Product Information

Photolithography.com offers spin coaters, mask aligners, developing equipment, and etching equipment for laboratory applications.

Resist Coating
  <Maximum Substrate Size>
Resist Coating

4 in.
6 in.
8 in.
12 in.
100×100mm
150×150mm

MS-B100
MS-B150
MS-B200
MS-B300
MS-B200 (Shield type)
MS-B300 (Shield type)

   

●Sample Stages (standard)
●Sample Stages (customized)

images
Exposure
  Exposure MA-20
MA-10
MA-60F
M-2LF
M-1S
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Development
  Development AD-1200
AD-3000
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Etching
  Etching ED-1200
ED-3000
Please feel free to contact us!Thank you very much for visiting Photolithography.com. Leave everything to us regarding coaters, mask aligners, and other photolithography equipment.