Product Information

Photolithography.com offers spin coaters, mask aligners, developing equipment, and etching equipment for laboratory applications.

Resist Coating
  <Maximum Substrate Size>
Resist Coating

4 in.
6 in.
8 in.
12 in.
100×100mm
150×150mm

●MS-B100
●MS-B150
●MS-B200
●MS-B300
●MS-B200 (Shield type)
●MS-B300 (Shield type)

   

●Sample Stages (standard)
●Sample Stages (customized)

images
Exposure
  Exposure ●MA-20
●MA-10B
●MA-60F
●M-2LF
●M-1S
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Development
  Development ●AD-1200
●AD-3000
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Etching
  Etching ●ED-1200
●ED-3000
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