Concepts

As a leading manufacturer of laboratory semiconductor manufacturing equipment, Photolithography.com can provide proven one-stop services regarding photolithography, including coating, exposure, development, and etching.

		We have been developing various types of laboratory equipment since the 1960s. As a leading manufacturer, we take pride in our track record of delivering more than 7000 units to our customers.
		We offer laboratory semiconductor manufacturing equipment used in the photolithography process, including coating, exposure, development, and etching, on a one-stop basis.
		We have verification data on various coating materials to support your research.
		Our quality repair and maintenance services are available to support customers.

We have been developing various types of laboratory equipment since the 1960s. As a leading manufacturer, we take pride in our track record of delivering more than 7000 units to our customers.

◆Delivery Record
	As a leading manufacturer of laboratory spin coaters and mask aligners, Photolithography.com (Mikasa) has delivered more than 7000 units to its customers.

◆ International Delivery Record
	China, Taiwan, South Korea, Singapore, Malaysia, India, Thailand, U.S.A., and Australia

◆Previous Spin Coaters

◆Previous Mask Aligners

We offer laboratory semiconductor manufacturing equipment used in the photolithography process, including coating, exposure, development, and etching, on a one-stop basis.

We offer all equipment required for the front-end stages of semiconductor manufacturing, including resist coating, exposure, development, and etching, on a one-stop basis. In addition.

We have verification data on various coating materials to support your research.

（Coating）	●We have verification data (coating thickness distribution) on various coating materials.
	●I have held a variety of test data. 　・Thick coatings up to 100 μm thick can be formed. 　・Coating thickness uniformity and more

＜Coating Thickness Distribution Data＞

Coater	MS-B200
Coating thickness measurement system	F50 (from Filmetrics)
Resist	OFPR-800LB (from Tokyo Ohka Kogyo Co., Ltd.)
Substrate size	8-inch-dia. silicon wafers
Target coating thickness	1μm
Coating thickness distribution	±0.5％

＜Coating Thickness Distribution Data＞

Coater	MS-B200 (Shield type)
Coating thickness measurement system	F50 (from Filmetrics)
Resist	OFPR-800LB (from Tokyo Ohka Kogyo Co., Ltd.)
Substrate size	65×65mm
Coating thickness distribution	±0.7％

（Exposure）●We have a large database of verification data (resist patterns).

Mask aligner	MA-20
Line width	1μm (L&S)
Resist	OFPR-800LB (from Tokyo Ohka Kogyo Co., Ltd.)
Coating thickness	1μm

Mask aligner	MA-20
Line width	8μm (rectangular holes)
Resist	e-PR THICK (from eChem Solutions Japan Inc.)
Coating thickness	6.3μm

Mask aligner	MA-20
Line width	7μm(cylinders)
Resist	SU-8 (from Nippon Kayaku Co., Ltd.)
Coating thickness	30μm

Our quality repair and maintenance services are available to support customers.

◆Service networks in and outside Japan
　・Two service locations in Japan
　　Tokyo：2-8-1, Shibakoen, Minato-ku, Tokyo 105-0011, Japan　　Phone: +81-3-3433-8216
　　Osaka：1-13-35, Higashinakajima, Higashiyodogawa-ku, Osaka 533-0033, Japan　　Phone: +81-6-6325-5661
　・Two service locations outside Japan
　　China (Shanghai)：Ushio (Shanghai) Inc. (http://www.ushio.com.cn/)
　　Taiwan (Taibei)：Kawakawa Co., Ltd. (Website: www.kawakawa.com.tw)

◆Repair and maintenance staff
　・Eight members in Japan
　・Four members outside Japan

◆ Technology and services (alternative units)

Please feel free to contact us!Thank you very much for visiting Photolithography.com. Leave everything to us regarding coaters, mask aligners, and other photolithography equipment.