Product Information
Mask Aligners
| ■ | Manual contact mask aligners. |
| ■ | Can handle silicon, glass, chemical compound, film, and various other materials as well as irregularly-sized substrates. |
| ■ | Three types of exposure sources—collimator, multi-mirror, and integrator—are available to suit your budget and applications. |
| ■ | Models are available that can handle substrates 5 × 5 mm to 100 × 100 mm in size and up to 6 inches in diameter. |
| ■ | Easily replaceable mask holders and sample stages make the aligners ideal for research and development. |
| ■ | Objective lenses for the alignment scope come in two magnifications (10× 20×) for accurate alignment, coating thickness measurement, and other applications. |
MA-10B Mask Aligner
[Model suitable for 4-inch-dia. substrates]
Product Features
■Manipulator stage moves ± 50 mm and alignment is easy to align
■Prevents malfunction by providing sensor in moving part
■Lightweight design * Our MA-10 comparison
■Mask drop prevention drawer attachment * Made according to mask glass specifications
■Suitable for irregular size substrates * Vacuum adsorption sample table prepared according to substrate
Product Specifications
| Maximum substrate size | 4 in. dia. |
|---|---|
| Maximum substrate thickness | 2 mm |
| Maximum mask size | 5 × 5 in. |
| UV lamp house | Collimator type |
| Illuminance | > 8 mW/cm2 (at 405 nm) |
| Illuminance uniformity | < ±8.5% |
| Exposure source | UV lamp, 250 W |
| Exposure wavelength | Broadband (g/h/i-line) |
| Effective irradiation surface | 4 in. dia. |
| Exposure timer | 0 to 999.9 sec (timer setting mode) |
| UV lamp degradation correction function | Cannot be attached. |
| Alignment scope | Microscope with two fields of view; objectives spaced at intervals of 18 to 60 mm |
| Microscope resolution | 1.2 μm (when the 20× objective is used) |
| Alignment gap measurement function | Cannot be attached. |
| Contact method | Soft contact and hard contact |
| Operation unit | Touch panel type |
| Safety function | Mask / wafer adsorption Z axis lower limit position Scope swing UP ・ DOWN position Stage lock position |
| Movement range of manipulator | X/Y:±6.5mm,fine movement in 0.025mm steps,one full rotation θ:50°,fine movement in ±5°steps Z:10mm,fine movement in 0.025mm |
| Movement range of crosswise motion stage | X/Y:±50mm |
| Utility | Air: 0.5 MPa, for driving the microscope/for stage lock N2: 0.5 MPa, for blowup Vacuum: -0.08 MPa, for suction of masks and substrates |
| Power supply | 100V AC, 9 A |
| Outside dimensions (mm) | 750W×600H×650D |
| Weight | about 90kg |
| Optional | Anti-vibration table Vacuum pump Triple eyepiece tube monitor specification Exposure light source 500 W spec |
Note: Specifications are subject to change without notice.
MA-20 Mask Aligner
[Model suitable for 4-inch-dia. substrates]
Product Specifications
| Maximum substrate size | 4 in. dia. |
|---|---|
| Maximum substrate thickness | 2mm |
| Maximum mask size | 5 × 5 in. |
| UV lamp house | Multi-mirror type |
| Illuminance | > 14 mW/cm2 (at 405 nm) |
| Illuminance uniformity | < ±4.0% |
| Exposure source | UV lamp, 500 W |
| Exposure wavelength | Broadband (g/h/i-line) |
| Exposure timer | Switched between modes: 0 to 999.9 sec (timer setting mode) 1 to 9999 counts (cumulative light quantity counter mode) |
| UV lamp degradation correction function | Included as standard |
| Alignment scope | Microscope with two fields of view; objectives spaced at intervals of 18 to 60 mm |
| Microscope resolution | 1.2 μm (when the 20× objective is used) |
| Alignment gap measurement function | Included as standard |
| Contact method | Soft contact and hard contact |
| Movement range of manipulator | X/Y: ±5 mm, fine movement in 1/8-mm steps, one full rotation θ: 70°, fine movement in ±7° steps Z: 4 mm (1 mm for pneumatic driving and 3 mm for coarse movement), fine movement in 0.16-mm steps |
| Movement range of crosswise motion stage | X/Y: ±20 mm |
| Power supply | 100 to 110 V AC, 20 A |
| Utility | Air: 0.5 MPa, for driving the mask stage and microscope N2: 0.5 MPa, for blowup Vacuum: -0.08 MPa, for suction of masks and substrates |
| Outside dimensions (in mm, including anti-vibration table) | 1000 W × 1300 H × 800 D |
| Weight | 290 kg |
| Anti-vibration table | Included as standard |
Note: Specifications are subject to change without notice.
| Model used | MA-20 |
|---|---|
| Line width | 1μm(L＆S) |
| Resist | OFPR-800LB (from Tokyo Ohka Kogyo Co., Ltd.) |
| Coating thickness | 1 μm |
| Model used | MA-20 |
|---|---|
| Line width | 8μm(rectangular holes) |
| Resist | e PR-THICK (from eChem Solutions Japan Inc.) |
| Coating thickness | 6.3 μm |
| Model used | MA-20 |
|---|---|
| Line width | 7μm(cylinders) |
| Resist | SU-8 (from Nippon Kayaku Co., Ltd.) |
| Coating thickness | 30 μm |
Gap Sample Stage
【Features】
■ Enables proximity exposure.
■ Gap settings are configured physically using pins.
・Gap can be customized between 10 and 200 μm.
・The pins are accurate within ±5 μm.
・It can be set at intervals of 10 μm."
■ Ideal for exposure that requires no contact with the mask.
・Various SEM images of SU-8 obtained through experiments are available.
■ Can be added to your existing system.
Gap Sample Stage
SEM Images Obtained by Performing Simplified Proximity Exposure Using the MA-20 SEM Images Obtained by Performing Simplified Proximity Exposure Using the MA-20
Resist: SU-8, with a coating thickness of 50 μm. A high-pass filter is used.
MA-60F Mask Aligner
[Model suitable for 6-inch-dia. substrates]
Product Specifications
| Maximum substrate size | 6 in. dia. |
|---|---|
| Maximum substrate thickness | 2 mm |
| Maximum mask size | 7 × 7 in. |
| UV lamp house | Integrator type |
| Illuminance | > 18 mW/cm2 (at 405 nm) |
| Illuminance uniformity | < ±5.0% |
| Exposure source | UV lamp, 250 W (500 W optionally available) |
| Exposure wavelength | Broadband (g/h/i-line) |
| Exposure timer | Switched between modes: 0 to 999.9 sec (timer setting mode) 1 to 9999 counts (cumulative light quantity counter mode) |
| UV lamp degradation correction function | Included as standard |
| Alignment scope | Microscope with two fields of view; objectives spaced at intervals of 18 to 60 mm |
| Microscope resolution | 1.2 μm (when the 20× objective is used) |
| Alignment gap measurement function | Included as standard |
| Contact method | Soft contact and hard contact |
| Movement range of manipulator | X/Y: ±5 mm, fine movement in 1/8-mm steps, one full rotation θ: 70°, fine movement in ±7° steps X/Y: ±20 mm |
| Movement range of crosswise motion stage | Z: 4 mm (1 mm for pneumatic driving and 3 mm for coarse movement), fine movement in 0.16-mm steps |
| Power supply | 100 to 110 V AC, 20 A |
| Utility | Air: 0.5 MPa, for driving the mask stage N2: 0.5 MPa, for blowup Vacuum: -0.08 MPa, for suction of masks and substrates |
| Outside dimensions (in mm, including anti-vibration table) | 1130 W × 1650 H × 800 D |
| Weight | 360 kg |
| Anti-vibration table | Included as standard |
Note: Specifications are subject to change without notice.
| Model used | MA-60F |
|---|---|
| Line width | 2 μm(L&S) |
| Resist | OFPR-800LB (from Tokyo Ohka Kogyo Co., Ltd.) |
| Coating thickness | 1 μm |
| Model used | MA-60F |
|---|---|
| Line width | 6 μm (rectangular holes) |
| Resist | e-PR THICK (from eChem Solutions Japan Inc.) |
| Coating thickness | 6.2 μm |
M-2LF Mask Aligner
[Model suitable for 6-inch-dia. substrates]
Product Specifications
| Maximum substrate size | 6 in. dia. |
|---|---|
| Maximum substrate thickness | 2 mm |
| Maximum mask size | 7 × 7 in. |
| UV lamp house | Integrator type |
| Illuminance | > 18 mW/cm2 (at 405 nm) |
| Illuminance uniformity | < ±5.0% |
| Exposure source | UV lamp, 250 W (500 W optionally available) |
| Exposure wavelength | Broadband (g/h/i-line) |
| Exposure timer | 0 to 999.9 sec (timer setting mode) |
| UV lamp degradation correction function | Cannot be attached. |
| Alignment scope | Microscope with two fields of view; objectives spaced at intervals of 18 to 60 mm |
| Microscope resolution | 1.2 μm (when the 20× objective is used) |
| Alignment gap measurement function | Cannot be attached. |
| Contact method | Soft contact (Hard contact optionally available) |
| Movement range of manipulator | X/Y: ±5 mm, fine movement in 1/8-mm steps, one full rotation θ: 70°, fine movement in ±7° steps Z: 10 mm, fine movement in 0.16-mm steps |
| Movement range of crosswise motion stage | Optional |
| Power supply | 100 to 110 V AC, 20 A |
| Utility | N2: 0.5 MPa for hard contact Vacuum: -0.08 MPa, for suction of masks and substrates |
| Outside dimensions (in mm, including anti-vibration table) | 1000 W × 1680 H × 800 D |
| Weight | 280 kg |
| Anti-vibration table | Included as standard |
Note: Specifications are subject to change without notice.
M-1S Mask Aligner
[Model suitable for 3-inch-dia. substrates]
Product Specifications
| Maximum substrate size | 3 in. dia. |
|---|---|
| Maximum substrate thickness | 2 mm |
| Maximum mask size | 4 × 4 in. |
| UV lamp house | Collimator type |
| Illuminance | > 8 mW/cm2 (at 405 nm) |
| Illuminance uniformity | < ±8.5% |
| Exposure source | UV lamp, 250 W |
| Exposure wavelength | Broadband (g/h/i-line) |
| Exposure timer | 0 to 999.9 sec (timer setting mode) |
| UV lamp degradation correction function | Cannot be attached. |
| Alignment scope | Stereo microscope (zoom system) |
| Microscope resolution | 3.7 μm (with zoom ratio set to 1×) |
| Alignment gap measurement function | Cannot be attached. |
| Contact method | Soft contact (Hard contact optionally available) |
| Movement range of manipulator | X/Y: ±5 mm, fine movement in 1/8-mm steps, one full rotation θ: 70°, fine movement in ±7° steps Z: 3 mm, fine movement in 0.16-mm steps |
| Movement range of crosswise motion stage | Cannot be attached. |
| Power supply | 100 to 110 V AC, 20 A |
| Utility | N2: 0.5 MPa for hard contact Vacuum: -0.08 MPa, for suction of masks and substrates |
| Outside dimensions (mm) | 800 W × 730 H × 500 D |
| Weight | 100 kg |
| Anti-vibration table | Optional |
Note: Specifications are subject to change without notice.
